
Ga2O3 Targets
4N Ø100×8mm >80%
4N Φ50.8mm;Φ76.2mm;Φ101.6mm
Powder: 5N 2-5μm 50g;100g;500g;1kg
Advantage
1. the content of the impurity elements is very low
2. good electrical conductivity, product density is good
3. the preparation is usually made by chemical refining, electrolysis refining, extraction refining, etc.
Application:
Magnetron sputtering coating material;
Packaging:
Vacuum packaging / vacuum neutral packing / special packaging reinforcement packaging
Manufacturing process:
Chemical refining, electrolytic refining, extraction refining, etc.
Applicable instrument
Various types of magnetron sputtering equipment
Date of delivery
Single piece material delivered within 1 weeks, batch material 7 to 10 working days delivery;
MOQ
target:1pc' powder:100g