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Hafnium oxide, HFO2, hafnium oxide, hafnium oxide, optical coating materials,high purity hafnium oxide sintering
Chemical name: HFO2
Appearance: white
Molecular weight: 210.49
Density: 9.7g/cm³
Melting point: 2500℃
Refractive index (wavelength /nm): 1.9-2.1 (300)
1.84-2.0 (2500)
Boiling point: 5400℃
Linear expansion coefficient: 5.8 * 10-6/ C (250-1300)
10's 4 vacuum evaporation temperature: 2500℃
Evaporation mode: electron beam
Transparent band /nm:235-2500
Dielectric constant: 20.5-23
Volume: 0.05μF/cm2
Capacitance temperature coefficient TCC:(1.25～2.50)×10-4/℃
Performance: suitable for evaporation of electron gun, film densification and stability. Excellent material for ultraviolet band. Does not dissolve in water, resistant to chemical properties, but at high temperatures can react with the hydroxide, the film is hard;
Application: it is mainly used in the ultraviolet film, anti - Anti - film or high - back - film and fire - resistant material, UV - near - infrared multilayer film.
HfO2 thin film is a kind of insulating oxide, can make the film resistance, but also can be used as a film, the general use of sputtering deposition.